Modelling of Hydrogen Microwave Plasma in the Conditions of Diamond Deposition

Mohamed El Haim(1*), Mimoun El Hammouti(2), Hassan Chatei(3), Mohamed El Bojaddaini(4), Mohamed Atounti(5)

(1) Multidisciplinary Faculty of Nador, University Mohammed First-Oujda, Morocco
(2) Multidisciplinary Faculty of Nador, University Mohammed First-Oujda, Morocco
(3) Faculty of Science, University Mohammed First-Oujda, Morocco
(4) Faculty of Science, University Mohammed First-Oujda, Morocco
(5) Multidisciplinary Faculty of Nador, University Mohammed First-Oujda, Morocco
(*) Corresponding author

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A 2D-fluid plasma model has been developed for a microwave cavity plasma reactor used for diamond thin film deposition. Dependencies of discharge characteristics on the main physical parameters namely the hydrogen pressure and the microwave power density have been numerically studied. The pure hydrogen plasma characteristics, such as electron density, electron temperature and electric potential are simulated by applying a COMSOL MWP module based on finite element method to solve electron continuity and electron energy equations coupled with Poisson’s equation. This present paper provides the spatial and temporal evolutions of different discharge characteristics for various input conditions. It is shown that the electron density was in the range (5×1016-8×1017)m-3 for the pressure range of (40-60)Torr. It is also clearly shown that as the power density increases the electron density increases and that the electron temperature and electric potential vary slightly with gas pressure and microwave power density.

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Fluid Plasma Model; Finite Element Method; COMSOL MWP Module; Microwave Plasma

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