COMSOL Multiphysics Simulations of the Hydrogen Microwave Plasma Characteristics
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This paper presents the numerical simulation of a MPACVD (Microwave Plasma Assisted Chemical Vapor Deposition) reactor used for diamond thin film deposition. A COMSOL MWP module, based on fluid plasma model, has been used to study impact of hydrogen pressure and incident microwave power on plasma discharge characteristics such as electron density, electron temperature and electric potential, at low pressure. It is clearly shown that the plasma volume increases either by augmenting power and keeping a constant pressure or by decreasing pressure while maintaining a constant power. It is also seen that uniformity of the plasma is obtained as the gas pressure is decreased, and that electron density increases significantly as a function of pressure and power. However, electron temperature varies in the opposite direction of the electron density, in the ranges of power and gas pressure studied. Results also indicate that electric potential increases by augmenting the incident power and maintaining a constant pressure or decreasing the pressure while keeping a constant power. Comparisons between model and experimental results are mainly satisfactory and support the fact that average electron density varies in the range of (〖1×10〗^17÷〖8×10〗^17)m^(-3) for the input power range (50W-300W) at a given pressure value (1.5Torr).
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