Simulations of Surface Roughness of Nanocomposite Materials by Using Level Set Method


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Abstract


Roughness plays an important role in determining how a real object will interact with its environment. Although roughness is usually undesirable, it is difficult and expensive to control in manufacturing. Decreasing the roughness of a surface will usually increase exponentially its manufacturing costs. This often results in a trade-off between the manufacturing cost of a component and its performance in application. In this paper we have modeled  roughening of nanocomposite materials during both isotropic and anisotropic etching  by using a level set  method.  It was found that the presence of two phases with different etch rates takes effect on  the development of the surface roughness
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Keywords


Level Set Method; Etching; Roughness; Three Dimensional Simulations; Nanocomposite

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References


C. Cardinaud, M.C. Peignon, P.Y. Tessier, Plasma etching : principles mechanisms application to micro and nanotechnologies, Appl. Surf. Sci. Vol. 164, pp. 72, 2000.
http://dx.doi.org/10.1016/s0169-4332(00)00328-7

B. Shin, I.H. Park, J.W. Lee, T.W. Kim, C.W. Chung, High density plasma etching of amorphous CoZrNb films for thin film magnetic devices, Thin Solid Films Vol. 496, pp. 631, 2006 .
http://dx.doi.org/10.1016/j.tsf.2005.08.292

Hamaoka, T. Yagisawa, T. Makabe, Modeling of Si Etching Under Effects of Plasma Molding in Two-Frequency Capacitively Coupled Plasma in SF6/O2 for MEMS Fabrication, IEEE Trans. On Plasma Sceince Vol. 35, pp. 1350, 2007.
http://dx.doi.org/10.1109/tps.2007.901904

J.W. Coburn and HF Winters, Ion- and electron-assisted gas-surface chemistry: An important effect in plasma etching, J. Appl. Phys. Vol., pp. 3189-3196, 1997.
http://dx.doi.org/10.1063/1.326355

M. Radmilovic-Radjenovic, B. Radjenovic and Y.Lj. Petrovic, Application of level set method in simulation of surface roughness in nanotechnologies, Thin Solid Films Vol. 517, pp. 3954, 2009
http://dx.doi.org/10.1016/j.tsf.2009.01.123

W. Guo and H.H. Sawin, Review of profile and roughening simulation in microelectronics plasma etching, J. Phys. D: Appl. Phys. Vol. 42, pp. 194014, 2009.
http://dx.doi.org/10.1088/0022-3727/42/19/194014

E. Zakka, V. Constantoudis, E. Gogolides, Roughness Formation uring Plasma Etching of Composite Materials: A Kinetic Monte Carlo Approach, IEEE Trans. On Plasma Sceince Vol. 35, pp. 1359, 2007 1359.
http://dx.doi.org/10.1109/tps.2007.906135

B. Radjenović, J. K. Lee and M. Radmilović-Radjenović, Sparse field level set method for non-convex Hamiltonians in 3D plasma etching profile simulations, Computer Physics Communications Vol. 174, pp. 127, 2006.
http://dx.doi.org/10.1016/j.cpc.2005.09.010

B. Radjenović, M. Radmilović-Radjenović and M. Mitrić, Nonconvex Hamiltonians in three dimensional level set simulations of the wet etching of silicon, Appl. Phys. Lett. Vol. 89, pp. 213102, 2006.
http://dx.doi.org/10.1063/1.2388860

B. Radjenović and M. Radmilović-Radjenović, 3D Etching profile evolution simulations: Time dependence analysis of the profile charging during SiO2 etching in plasma, Journal of Physics: Conference Series Vol. 86, pp. 012017, 2007.
http://dx.doi.org/10.1088/1742-6596/86/1/012017

D.J. Economou, Thin Solid Films Vol. 365 pp. 348, 2000.
http://dx.doi.org/10.1016/s0040-6090(99)01056-1

J. A. Sethian and D. Adalsteinsson, Overview of Level Set Methods for Etching, Deposition, and Lithography Development, IEEE Transactions on Semiconductor Devices, Vol. 10, pp. 167, 1997.
http://dx.doi.org/10.1109/66.554505

J.A. Sethian, Level Set Methods and Fast Marching Methods : Evolving Interfaces in Computational Geometry, Fluid Mechanics, Computer Vision, and Materials Science (Cambridge University Press, 1999).
http://dx.doi.org/10.1108/k.2000.29.2.239.3

X-Y. Luo, M-J. Ni, A. Ying and M. Abdou, Application of the level set method for multi-phase flow computation in fusion engineering, Fusion Engineering and Design, Vol. 81, pp. 1521, 2006.
http://dx.doi.org/10.1016/j.fusengdes.2005.09.051

J.T. Drotar, Y.P. Zao, T.M. Lu and G.C. Wang, Surface roughening in shadowing growth and etching in 2+1 dimensions, Phys. Rev. B. Vol. 62, pp. 2118, 2000.
http://dx.doi.org/10.1103/physrevb.62.2118


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